System and method for treating water systems with high voltage discharge and ozone

ABSTRACT

A system and method for treating flowing water systems with a plasma discharge to remove or control growth of microbiological species. Components of the water system are protected from being damaged by excess energy from the electrohydraulic treatment. Ozone gas generated by a high voltage generator that powers the plasma discharge is recycled to further treat the water. A gas infusion system may be used to create fine bubbles of ozone, air, or other gases in the water being treated to aid in plasma generation, particularly when the conductivity of the water is high. An electrode mounting assembly maintains a high voltage electrode and ground electrode at a fixed distance from each other to optimize plasma generation. An open support structure for the high voltage generator circuit physically separates spark gap electrodes and resists metal deposits that may disrupt discharge of a high voltage pulse to create the plasma.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application claims the benefit of U.S. Provisional Application Ser.Nos. 61/983,678 and 61/983,685, both filed on Apr. 24, 2014. Thisapplication is also a continuation-in-part of U.S. application Ser. No.14/260,605 filed on Apr. 24, 2014, which claims the benefit of U.S.Provisional Application Ser. No. 61/818,229, filed on May 1, 2013.

BACKGROUND OF THE INVENTION 1. Field of the Invention

This invention relates to a system and method for treating flowing watersystems using a high voltage discharge to generate plasma and using theozone by-product from the high voltage generation for enhanced treatmentof the water. The system and method of the invention are particularlyuseful in treating cooling tower or other recirculating or closed-loopsystems.

2. Description of Related Art

Anthropogenic water systems are critical components commonly found inmost of the world's energy producing facilities, industrial andmanufacturing plants, hospitals, and other institutional complexes andbuildings. These systems consume around 700 billion gallons of waterannually with a cost of $1.8 billion in make-up water and sewagehandling costs alone. All of these anthropogenic water systems requiresome form of treatment, either chemical or non-chemical, to control thebuild-up of scale, biofilm and other corrosion by-products on theimportant heat transfer surfaces that are necessary for efficient systemoperation.

For water systems involving heat exchange, such as cooling towers andboilers, effective treatment to remove these contaminants and to prolongthe amount of time before the systems are re-contaminated can savesignificant amounts of money. An effective and thorough treatment maysave costs for labor and treatment chemicals by reducing the frequencyof periodic treatments or reducing the amount of chemicals needed forroutine maintenance and/or periodic treatments. Such a treatment mayalso save on energy costs through the operation of clean heat exchangesurfaces. Fouling of heat exchange surfaces costs U.S. industry hundredsof millions of dollars every year and is directly related to an increasein energy consumption of almost 3 quadrillion Btus (quads) annually.

To maximize the water usage and minimize waste, many of these systemsemploy a series of chemical treatments that protect the system againstscaling, biofilm formation, and corrosion. These chemical treatmentsallow the water to be reused and recycled a number of times before itbecomes necessary to discharge the water and replace it with freshwater. Increasing the duration for which the water may be circulatedsignificantly reduces the amount of water that is discharged to thesewage system and minimizes the amount of make-up water that is neededto replace the bleed off. However, many chemical treatment compositionsand methods may damage the components of the water system being treatedas the chemicals used are highly corrosive. There is also anenvironmental down side to harsh chemical treatments, including growingconcern over the formation of toxic disinfection-by-products such astrihalomethanes, haloacetonitriles, and halophenols that have beenidentified in the discharge water being released into the environment.It is estimated that there are 536 billion pounds of water treatmentchemicals discharged annually as a result of cooling tower treatments,which may impact a variety of species living in or near areas andwater-ways receiving the discharge or bacterial components of sewagetreatment plants receiving the discharge.

In an attempt to minimize the environmental impact associated with somechemical treatments, many water treatment companies, and moreimportantly their customers, are looking to use non-chemical based watertreatment technologies to maintain the performance of their systems.There are currently about 30 non-chemical treatment devices or waterconditioning technologies that are commercially available for use inboth commercial and residential water systems. These systems can bedivided into three categories: (1) Indirect chemical producers that usea benign or safe chemical additive such as air or salt to produce thebiocide. These systems include ozone generators and electrochemicalhypochlorite generators and mixed oxidant generators. (2) Directchemical producers that generate the active chemical species from directinteraction on the water. These devices use mechanical processes, suchas hydrodynamic cavitation or sonic cavitation, to produce hydroxylradicals along with localized areas of high temperatures and pressuresin the water. Other types of devices that would fit into this categoryare ultraviolet light systems. (3) Electrical and Magnetic devices,including plasma generation, use induced electrical and magnetic fieldsto induce ion migration and movement that can result in cell deaththrough electroporation, or on cyclotron resonance effects within thecell wall. Out of all of these technologies the electrical and magneticdevices are the most common; however, they are the technologies thathave the least rigorous scientific support. The direct and indirectchemical approaches have more scientific credibility; however, thisgreater understanding may have limited their potential applications andhence they have not been able to capture a larger portion of the marketshare.

The application of high voltage discharge and generating plasma withinwater is known in the prior art. For example, an article published by B.R. Locke et al. (Ind Eng. Chem Res 2006, 45,882-905) describes electrodeconfiguration and geometry, the pulsed arc vs. pulsed corona, and thechemical species that are formed during an electrohydraulic dischargeand non-thermal plasma in water discharge process. The article addressesmany of the fundamental issues related to using this technique for watertreatment, but it fails to address the practical applications related towater treatment in an industrial, commercial, or residentialenvironment, especially related to the need for multiple ground pointsto minimize the effect of the electromagnetic radiation released intothe water and surrounding atmosphere.

In a more recent publication Bruggeman et. al published an extensivereview on non-thermal plasmas in and in contact with liquids in which heoutlined 14 different reactor configurations that included many of theelectrode geometries outlined in the article by Locke. (P. Bruggeman,and C. Leys, J. Phys. D. Appl. Phys, 2009, 1-28). In most of thesereactor types the fluid being treated by the plasma discharge is a bulkdischarge system with no flow (such as a bubble corona dischargereactor, discharge reactor with submerged liquid jet, electrolysisdischarge reactor or capillary needle discharge reactor system);however, there is also a description of a dielectric barrier discharge(DBD) reactor where a fluid and air stream are introduced on either sideof the of the barrier in a bubble discharge reactor. The article notesthat even when the bubbles were not in contact with the electrodes therewas a possibility of generating plasma within the bubbles, and that thesparking voltage of the system decreases with increased bubble rate.There is no mention of the effect of bubble size on the spark voltage.Indeed it was also noted that bubbles when situated along the surface ofan insulator resulted in streamers that were shaped and situated alongthe bubble surface and that the discharge is always generated at thetriple junction between the electrode, the bubble wall, and theinsulator.

It is also know to use ozone gas to treat water. For example, in anarticle by Gupta et al. (S. B. Gupta, IEEE Transactions on PlasmaScience, 2008, 36, 40, 1612-163) the use of an advanced oxidationprocess resulting from pulsed discharges in water is described. Theprocess described by Gupta uses oxygen gas or ozone gas supplied intothe discharge reactor from secondary independent sources (and not fromthe high voltage generator). They also report that system output andperformance is highly dependent on solution conductivity. For systemswhere water conductivity can be high, such as in cooling tower andclosed loop applications, higher voltage discharges are needed and thisin turn creates problems with increased electromagnetic radiation.

In order to generate plasma or produce an electrohydraulic dischargebetween a high voltage electrode and a ground electrode in water,especially in a water system where the water chemistry (conductivity,chemical composition, dissolved solids, planktonic bacterial counts, pHetc.), can change over time requires a high voltage power supply thatcan generate up to and above over 200 kV potential difference betweenthe two electrodes. One known system for generating voltages sufficientto generate plasma or produce an electrohydraulic discharge in water isa Marx generator or a Marx ladder. A Marx generator uses a circuit thatgenerates a high voltage pulse by changing a set of capacitors inparallel then using a spark gap trigger to suddenly discharge thecapacitors in series. Typically, the components are supported by a framewithin a housing containing a pressurized gas. Many of these highvoltage generators are designed with maximum energy density as theultimate goal and are designed as such using gasses like SF₆ andincreased pressure in the spark gap chamber to facilitate higherbreakdown voltages. As a result of these high breakdown voltages, everytime the spark gap is activated there is some metallic loss as a portionof the spark gap electrode is vaporized. The vaporized metal may then bedeposited on components of the high voltage generator and after someaccumulation may disrupt the timing of the spark gap discharge. This isnot a problem for high voltage systems that are being run for shortperiods of time, such as for use with static water treatment operations;but, for a system that is designed to run for months to years at a time,such as for treatment of flowing water systems, this is highlyproblematic.

There are several prior art patents or published patent applicationsthat address plasma generation for various purposes, including watertreatment or purification, such as U.S. Patent Application Pub No.2009/0297409 (generation of flow discharge plasmas at either atmosphericor higher pressures), U.S. Patent Application Pub No. 2006/0060464(generation of plasma in fluids, in particular formed within the bubblesgenerated and contained in an aqueous medium and describing multipleelectrode configurations, including a configuration to trap the bubblesand have them act as a dielectric barrier to increase the voltage acrossthe electrodes), U.S. Pat. No. 6,558,638 (using high voltage dischargeto treat liquids, while incorporating a gas delivery means forgenerating bubbles in the discharge zone), and U.S. Patent ApplicationPub No. 2010/0219136 (pulsed plasma discharge to treat fluid such aswater at a flow rate of 5 gpm while consuming only 120-150 Watts ofpower).

There are also numerous patents disclosing Marx generator designs. Forexample, U.S. Pat. No. 3,505,533 discloses a Marx generator coupled witha Blumlein transmission line (a voltage doubling line). The spark gapsof the Marx are in an enclosed housing filled with a pressurized inertgas (CO2 and Argon) and the entire device is submersed in oil. U.S. Pat.No. 7,498,697 discloses a Marx generator with a conductive plasticconnection structure that is mounted to an insulating layer formechanical retention. The conductive plastic replaces coupling andcharging resistors and will have long term resistance to high voltages.

The known prior art discloses systems and methods for generating highvoltage discharges to generate plasma to create chemically activespecies, exhibit physical effects, and control water chemistry. However,the known prior art does not address the how to apply this technology ofusing plasma discharge to treat larger volumes of flowing water in anindustrial, commercial or residential setting over longer periods oftime without damaging other components of the water system, includingthe controllers and monitors that are needed for scale and corrosioncontrol, blowdown, and water conservation measures. Additionally, theknown prior art does not address use of this technology inre-circulating water systems having variable conductivity over time.Finally, the known prior art does not disclose the capture and use ofozone generated by a Marx generated as an additional water treatment.

SUMMARY OF THE INVENTION

This invention relates to a treatment system and method usingnon-chemical technologies to treat flowing water systems, such ascooling towers and closed-loop or recirculating water systems. Thistreatment system and method involves generating a high frequency andhigh voltage discharge between two electrodes submerged in the waterbeing treated. With each discharge between the electrodes there is anumber of long lived oxidative chemicals (ozone, hydrogen peroxide) andshort lived oxidative chemicals (super oxides, hydroxyl radicals, andhydrogen radicals) generated, UV radiation is also generated, togetherwith sonic shockwaves. These effects are well known in the prior art andhave been used for periodic treatment of static water systems, but havenot previously been used to effectively treat flowing or re-circulatingwater systems. According to one preferred embodiment of the invention, atreatment system and method for producing high voltage to generateplasma to treat water in a flowing or re-circulating water system areprovided. The treatment system and method effectively provide asubstantially continuous treatment for water flowing through a reactionchamber in which plasma is repeatedly generated at predetermined timeintervals over prolonged periods of operation, without damagingcomponents of the water system.

According to one preferred embodiment, a treatment system and methodutilize a plasma reaction chamber or reactor unit that enables a longterm plasma or electrohydraulic discharge to occur in flowing water thatcan have changing conductivity, temperature and dissolved solids. Onepreferred embodiment of a reactor unit according to the inventioncomprises a body that is capped on both ends with fittings that allowwater and optionally gasses to be introduced and removed from thereactor body, and for electrical connections to be made with the highvoltage and ground electrodes. According to another preferredembodiment, a reactor unit comprises an electrode mount assemblydisposed within the reactor unit. An electrode mount assembly preferablycomprises a configuration that reduced choke points with the reactor orplasma discharge zone and that funnels gas bubbles into the plasmadischarge zone to aid in plasma generation when the conductivity of thewater increases.

According to another preferred embodiment of the treatment system andmethod of the invention, ozone gas produced as a by-product of highvoltage generation is captured and used to enhance the water treatment.In order to maximize the reaction area for the high voltage dischargesin highly conductive water found in flowing and re-circulating watersystems, power supplies with the capability of generating over 200 kVare preferred. A by-product in the operation of these power supplies isthe production of ozone gas that should be removed or it may damagecomponents of the high voltage generator system, such as the supportstructure. In this embodiment, that ozone is captured and introducedinto the water being treated, preferably in a plasma reaction chamber,to enhance the water treatment.

According to yet another preferred embodiment, a gas infusing system isprovided to introduce the ozone by-product or other gases, such as airor reactive gases, into the water being treated to further enhance thetreatment. These gases are preferably added to the water prior toentering a reaction chamber where plasma generation occurs or aregenerated in-situ within a reaction chamber. Preferred embodiments of agas infusing system include a microbubbler, a venturi input or venturiinjector, hydrodynamic cavitation system, sonicating probes, or acombination thereof. A gas infusing system preferably introduces a finedispersion of bubbles into the water being treated, which further aidsin plasma generation because the dielectric breakdown strength ofair/gas is less than that of water. As the plasma breakdown is initiatedin air or gas molecules, ionized electrons from the air or gas moleculeswill then carryover and begin electron ionization in the watermolecules.

According to another preferred embodiment of a treatment system andmethod according to the invention, a continuous duty high voltagegenerator is provided. A preferred high voltage generator has a Marxgenerator or Marx ladder configuration. A known problem with prior artMarx generators is that metal from the spark gap electrodes becomesdeposited on the sides of the wall of the Marx ladder closed supportstructure and other components of the high voltage generator systemdisrupting the timing of the spark gap discharge, which would prevent orinterfere with the formation of plasma. A preferred embodiment of a Marxgenerator support structure according to the invention comprises an openframe of increased height and width to increase the distance between thespark gap electrodes. With the increased spacing between the spark gapelectrodes, metal deposits do not bridge the gap as quickly as with anarrower support enclosure. According to another preferred embodiment ofa Marx generator support structure, a bottom connecting portion of theframe is submerged in an oil bath to electrically isolate it from acapacitor bank. Another preferred embodiment comprises a supportstructure that is coated with a mineral oil to prevent or inhibit metaldeposits from forming on the surfaces of the support structure surfaceand to allow easy removal of any deposit that do form on the surfaces.According to another preferred embodiment, a support structure is madefrom ozone resistant materials, as ozone is known to weaken somematerials which can result in mechanical failure of the supportstructure. According to another preferred embodiment, a housing or coveris placed over the Marx generator support structure to capture ozone foruse in enhanced water treatment and to facilitate operation of the Marxgenerator at reduced or negative pressure.

According to another preferred embodiment of the invention, a system andmethod for treating water includes one or more control systems connectedto one or more components. According to a preferred embodiment, acontrol system times a pulsed high voltage discharge to occur atspecific time increments or intervals to prevent over heating of thewater, wiring, or other critical power supply components of thetreatment system and water system. According to yet another embodiment,a control system comprises a feedback loop that records the waterconductivity, which increases with cycles of re-circulation, as waterflows through the water system and treatment system. As the conductivityincreases, the controller increases the flow of air or other gases (sucha through a gas infusing system) into a reaction chamber to aid inplasma discharge.

According to another preferred embodiment of the invention, variousprotective devices, such as isolated power supply, grounded metalcomponents, and electromagnetic interference devices, are usedthroughout the treatment system and/or water system to protect thecomponents of the water system from excess voltage produced. Accordingto another preferred embodiment, excess energy produced by the highvoltage discharge (which is normally wasted) is captured to furthercondition and treat the water. Current is allowed to flow through wireloops connecting water system piping to a ground to generate a magneticfield in the water. This magnetic field has been shown to have abeneficial effect in water treatment and avoids the damaging effects ofthe large amounts of electromagnetic radiation throughout the entirewater system have on the electronic control systems used to measureconductivity, pH, biological activity, as well as to control pumps andother critical system components that are typically found with systemsthat directly generate a high voltage discharge into a water supply. Theuse of a high voltage discharge without having multiple ground points orother protective device in the water or adequate shielding around thehigh voltage components severely limits the applicability of theexisting prior art.

Treatment systems and methods according to the invention effectivelyremove biofilm and algae along with other deposits from the water in thewater system without requiring the use of harsh chemicals and withoutdamaging components of the water system. The treatment systems andmethods of the invention are also more effective than prior arttreatments since substantial deposits and algae were observed beingreleased from water systems treated according to the invention even whenthe water flowing through the water system was considered to be clean(based on prior chemical treatment or because it primarily consisted ofnew water from a municipal supply). When the treatments according to theinvention are used, increased copper corrosion rates are also observed,which indicates that the heat exchanger tubes are being effectivelycleaned of biofilm growth and other deposits resulting in increased heatexchange efficiency.

BRIEF DESCRIPTION OF THE DRAWINGS

The apparatus of the invention is further described and explained inrelation to the following drawings wherein:

FIG. 1 is a schematic view of one preferred embodiment of a systemaccording to the invention;

FIGS. 2A and 2B are graphs showing electromagnetic fields measured inone experiment when an embodiment of the invention was not applied;

FIG. 3 is a graph showing electromagnetic fields measured in anotherexperiment using a preferred embodiment of the invention;

FIG. 4 is a schematic view of another preferred embodiment of a systemaccording to the invention;

FIG. 5 is a schematic view of another preferred embodiment of a systemaccording to the invention;

FIG. 6 is a front elevation view of a preferred embodiment of a reactionchamber and electrode mount assembly according to the invention;

FIG. 7 is a front elevation of an alternate preferred embodiment of theelectrode mount assembly and ground electrode of FIG. 6;

FIG. 8 is a bottom perspective view of a preferred embodiment of a highvoltage mounting base according to the invention;

FIG. 9A is a bottom perspective view of another preferred embodiment ofa high voltage mounting base according to the invention;

FIG. 9B is a top plan view of the high voltage mounting base of FIG. 9A;

FIG. 10 is a top perspective view of a preferred embodiment of a groundelectrode mounting base according to the invention;

FIG. 11 is a bottom perspective view of the ground electrode mountingbase of FIG. 9;

FIG. 12 is a front elevation view of the ground electrode mounting baseof FIG. 9;

FIG. 13 is a bottom plan view of the ground electrode mounting base ofFIG. 9;

FIG. 14 is a bottom perspective view of another preferred embodiment ofa ground electrode mounting base according to the invention;

FIG. 15 is a perspective view of a preferred embodiment of a Marx laddersupport structure according to the invention;

FIG. 16 is a top plan view of the Marx ladder support structure of FIG.15;

FIG. 17 is a side elevation view of the Marx ladder support structure ofFIG. 15;

FIG. 18 is another perspective view of the Marx ladder support structureof FIG. 15;

FIG. 19 is a cross sectional, front elevation view of a preferredembodiment of a high voltage generator system, showing an outer housing,spark gap chamber, and Marx ladder support structure;

FIG. 20 is a top plan view of a portion of the high voltage generatorsystem of FIG. 19;

FIG. 21 is a perspective view of a portion of the high voltage generatorsystem of FIG. 19;

FIG. 22 is a circuit layout for the Marx ladder of FIG. 15.

DESCRIPTION OF THE PREFERRED EMBODIMENTS

A preferred embodiment of a treatment system according to the inventionis depicted in FIG. 1. Treatment system 10 preferably comprises a gasinfusing system 28, a plasma reaction chamber 36, a high voltagegenerator system 40, power system 46, and various component protectiondevices. Treatment system 10 is easily added to an existing water system12. Water system 12 can be any residential, commercial or industrialwater system, particularly those used for cooling applications andrecirculated water systems, such as cooling towers. Water system 12includes well known components that are not depicted in FIG. 1. A waterstream 14 from the water system 12 being treated passes through varioussensors 16 commonly used in monitoring water systems, such as pHsensors, temperature, and conductivity. Depending on the size of thewater system 12 and volume of water flowing through the water system 12,all of the water in the system may pass through the treatment system 10or only a portion or side stream may pass through treatment system 10.Most preferably, treatment system 10 comprises a shut-off valve ordiverter to bypass the treatment system, such as when the treatmentsystem is shut-down for maintenance, without having to also shut-down orreduce flow of water through the water system

Water stream 18 preferably flows through gas infusing system 28, whichinfuses water stream 18 with fine bubbles of air and/or gas. Preferably,gas infusing system 28 comprises one or more micro-bubbler devices 20,where air or gas 22, reactive gas 26, and/or ozone 30 are introducedinto the water stream as fine bubbles upstream of plasma reactionchamber 36. Reactive gases, such as ozone, mono-atomic oxygen,meta-stable singlet delta oxygen, vapor phase hydrogen dioxide, chlorinegas, chlorine dioxide gas, may also be used to achieve maximum removalof microbiological species from water system 12. The use and selectionof such gases will depend on water conditions within water system 12. Itis not required to add air, ozone, or other gas streams to water stream18, or that such be added as micro-bubbles, but the micro-bubbles aid inplasma generation and the ozone gas or reactive gas also serve to treatthe water of the water system. If bubbles are added, stream 24, infusedwith bubbles feeds plasma reaction chamber 36, otherwise stream 18 feedsplasma reaction chamber 36.

In another preferred embodiment gas infusing system 28 comprises aventuri system for infusing a fine bubble dispersion of air/gas,reactive gas, and/or ozone into water stream 18 to produce water stream24. The venturi input is located upstream of the high voltage reactionchamber 36 and introduces micro-bubbles of one or more of these gasesinto the high voltage discharge area within the reaction chamber 36. Inanother preferred embodiment the micro-bubbles are generated byincorporating a hydrodynamic cavitation system that introduces a highlydispersed suspension of micro-bubbles produce by the hydrodynamiccavitation process into a reaction zone within reaction chamber 36. In afourth preferred embodiment, a venturi system and hydrodynamiccavitation system are used together. The combination has the advantageof generating a synergistic environment for optimized reaction kineticsand active species generation. In a fifth preferred embodiment, the highvoltage reaction chamber 36 could be coupled with a plurality ofsonicating probes that could generate micro-bubbles in situ within ahigh voltage discharge zone within chamber 36, again providingsynergistic reaction performance. Finally in a sixth preferredembodiment, one or more of these gases could be venturied into the highvoltage reaction zone together with the micro-bubbles being generated bythe sonicating probes. The introduction of micro-bubbles using any ofthese systems or devices or any combination of these systems anddevices, the components and applications of which are well known in theart, further aid in plasma generation because the dielectric breakdownstrength of air or gas is less than that of water. As the plasmabreakdown is initiated in the air or other gas molecules, ionizedelectrons from the air or other gas will then carryover and beginelectron ionization in the water molecules.

According to another preferred embodiment, one or more components of agas infusing system 28 are connected to a controller (which may be acontroller for the water system or a separate controller for thetreatment system). The controller operates to increase the flow of airor other gases into reaction chamber 36 in response to increasedmeasurements of conductivity in the water (which is typically measuredas part of the water system control functionality). The increased airflow aids in ensuring that a plasma discharge occurs even when theconductivity of the water is high.

Reaction chamber 36 preferably comprises a sealed, water-tight housing35 surrounded and shielded by an inner dielectric barrier layer 34 a andouter ground shield 34 b. The dielectric barrier 34 a is anon-conductive layer that prevents arcing to the ground layer 34 b,which is a conductive outer layer tied to the ground. The dielectricbarrier 34 a and ground shield 34 b reduce electromagnetic interferencesradiating from the reaction chamber 36. If reaction chamber 36 is notshielded, sensitive electronic equipment may be damaged by the plasmagenerated within the chamber 36. Within reaction chamber 36 are disposeda high voltage electrode and a ground electrode which generate a plasmadischarge within chamber 36 as voltage generated in high voltagegenerator system 40 is transmitted to the high voltage electrode withinchamber 36. These components for generating a plasma discharge are wellknown to those of ordinary skill in the art. The shape and configurationof reaction chamber 36, housing 35, and the high voltage and groundelectrodes within reaction chamber 36 are not critical and any knownshape and configuration may be used, although a preferred embodiment ofan electrode mount assembly and reaction chamber as shown in FIGS. 6-7and discussed below is most preferably used. Another ground 48 is alsodisposed in contact with ground layer 34 b surrounding housing 35, whichis needed to generate the plasma discharge in reaction chamber 36.Ground 48 may act as a ground electrode or may be connected to a thickerrod or other conductor to act as the ground electrode. A highlyinsulated high voltage wire 38 connects the high voltage generatorsystem 40 with the high voltage electrode in reaction chamber 36. Wire38 is preferably insulated with a high strength dielectric to preventarcing to other electronic devices, metal structures, orpeople/operators. Wire 38 may act as the high voltage electrode or maybe connected to a thicker rod or other conductor to act as theelectrode. Treated water stream 50 exits the reaction chamber 36 andreturns to sump 54 (particularly where water system 12 is a coolingtower) or other components or piping of water system 12 to berecirculated through the system. Inlet and outlet couplings for waterstreams 24 and 50 into and out of chamber 36 should be grounded.

High voltage generator system 40 may generate a high frequency, highvoltage pulse that exceeds 200 kV on each discharge step. The highvoltage generator system 40 preferably comprises a Marx ladder or Marxgenerator 42 disposed within a spark gap chamber 41 within an outerhousing 43 (such as in the preferred embodiment shown in FIG. 19) thatincludes a dielectric barrier to isolate the Marx ladder 42 from thesurrounding environment and prevent arcing from the internal componentsto nearby metal structures, electrical outlets, and other monitoring andcontrol systems. To be effective in treating conductive waters similarto those seen in traditional cooling towers or closed loop systems, thehigh voltage generator system 40 is preferably capable of a voltageoutput of 200 kV for an electrode gap of around 5 mm between the highvoltage discharge electrode and the ground electrode in the reactionchamber 36. Although other gap distances may be used with modificationsthat would be understood by one of ordinary skill in the art, a gapdistance of around 5 mm is preferred. This is preferred because a largergap distance requires an increase in output voltage, which can introduceadditional issues, such as component failure in the high voltagegenerator system 40, and a smaller gap distance reduces the volume ofwater being exposed to the plasma discharge.

In one preferred embodiment, the high voltage generator system 40comprises a stage 1 low voltage component (driver circuit 39, as shownin FIGS. 19 and 22) that takes the 110V output from a typical walloutlet and generates a 40 kV DC signal. This is achieved by a Zero Voltswitching circuit that pulses the input from a flyback transformer. Thenumber of turns on the transformer can be increased or decreased tochange the output voltage of the flyback transformer. An advantage ofusing a Zero Volt Switching driver circuit is that it features a highnoise immunity, that is not susceptible to electromagnetic interferencethat is created in pulsed power systems. Digital or other circuits canalso be used, but they are more sensitive to outside interferencegenerated by the plasma reaction chamber 36 than a Zero Volt Switchingdriver. To protect the electronics from the high voltage output this isconstructed as a separated shielded entity. The signal from the stage 1low voltage component (driver circuit 39) is used to charge a capacitorbank in the Marx generator 42, which has the capacitors assembled inparallel. When the capacitor bank reaches the discharge limit, ittriggers a cascading discharge event between spark gaps in a Marx ladderso as the terminal voltage is greater than 200 kV between the dischargeand ground electrode.

Air pumps 44 or other devices to pressurize or blow air are preferablyintegrated into high voltage generator system 40, but may also beexternal to generator 40 and connected with appropriate conduit topermit air flow into generator 40. Air pumps 44 blow air through thehigh voltage generator system 40 to quench the electrodes of the Marxladder 42, which aids in increasing electrode lifetime. Air pumps 44flush air across the electrodes and out of the spark gap chamber 41.Ozone gas 30 generated from the spark gap chamber 41 is withdrawn fromhigh voltage generator system 40 and preferably recycled back to beinjected or infused into water stream 18 to provide further watertreatment Ozone gas generated from the Marx ladder is typicallyconsidered a waste product, but it is beneficially used according to theinvention as a source of water treatment. Most preferably, the ozone gas30 is venturied into water stream 18 at or near an inlet into reactionchamber 36. This permits the introduction of ozone (and other componentsof air, such as nitrogen) into the water supply and also aerates thewater stream 18 with fine micro-bubbles to form feed stream 24. The useof the ozone by-product from the high voltage generator system 40combined with plasma discharge has been found to be synergistic andparticularly effective in reducing planktonic bacteria in the waterbeing treated.

Treatment system 10 also comprises a power system 46 and variousprotective devices to protect the components of the water system fromexcess voltage produced. Power system 46 preferably comprises anuninterruptable power supply or isolation transformer, which reduces anytransient voltage spikes from entering the power supply of the buildingin which water system 12 is housed. This also isolates the high voltagegenerator system 40 from other electronic components of the building andthe water system 12, such as sensors 16 which have a separate,uninterruptable power supply or isolation transformer 60. A groundedmetal component 56 is preferably placed in a water reservoir for thewater system 12 (such as sump 54 in the case of a cooling tower).Grounded metal component 56 is preferably a piece of metal or mesh witha large surface area, but other shapes and configurations may be used.This grounded component reduces or eliminates electromagneticinterference through the water. Electromagnetic interference suppressors58 are preferably connected to or clamped on electronic components ofwater system 12, particularly any sensors (such as sensors 16) that willbe used to monitor water qualities—such as conductivity, temperature,and pH. Other grounding devices, such as 52, may be added as necessaryto other reservoirs or piping within water system 12 or connecting watersystem 12 with treatment system 10. In one preferred embodiment,grounding device 52 comprises a screw inserted into a wall of a pipethrough which water in the water system is flowing, with a length ofwire connected at one end to the head of the screw and wrapped aroundthe pipe several times, with the other end connected to ground. Othergrounding devices or configurations may also be used as will beunderstood by those of ordinary skill in the art. Typically, thesegrounding devices will be placed on or near specific types of equipment,such as a corrater (corrosion monitoring system), chemical controller,flow controller, conductivity probe, or will be spaced out throughoutthe water system with 2-4 devices used in most large water systemapplications. These grounding devices serve to protect the components ofwater system 12 and also allow the energy from the multiple groundpoints to be harvested and stored in a capacitor or inductor. Theharvested and stored energy may be used to generate low level energeticfields (electromagnetic or electrochemical) that provide furtherbenefits to the water treatment process. Electromagnetic fields havebeen used to prevent chemical scale formation and have been used toinduce electroporation and ion cyclotron resonance, which have beenshown to have antimicrobial properties. Electrochemical reactions cangenerate areas of localized high and low pH and can induceelectroporation as well. They may also generate low levelelectromagnetic fields locally within the water system without storingthe energy. For example, with a wrapped wire device around a pipe in thewater system as described above, each time a pulse (from the plasma) issinked to ground, a current will flow through the wire loops around thepipe to generate a magnetic field in the water flowing through the pipeat that location.

Treatment system 10 also preferably comprises a controller or a timer inorder to activate the treatment system 10 at periodic intervals. Acontroller or timer would periodically turn on various components,including power system 46 to charge the high voltage generator system40, air pumps 44, and components of gas infusion system 28, such asmicrobubbler 20. Once high voltage is discharged from high voltagegenerator system 40 to reaction chamber 36 and a plasma discharge isgenerated within reactor housing 35, the components of the treatmentsystem would be shut-off until it is time for the next cycle. Thisactivation/deactivation cycle repeats at periodic intervals, preferablyaround 15 minute intervals, over the course of a substantiallycontinuous treatment cycle lasting several weeks to several monthsduring normal operations of the water system and treatment system.Periodic activation/deactivation reduces overall system heating andincreases efficiency. As the system heats up, more energy will bedissipated in the Marx generator 40, which results in more charginglosses and less energy being available for plasma generation withinreactor housing 35. Allowing the system to cool during periodicdeactivation reduces charging losses and increases efficiency. Periodicactivation/deactivation will also allow the ozone from the spark gapchamber to be flushed out on a regular basis (and preferably fed intoreactor housing to enhance the water treatment) and maintain a pulsedarc discharge over the greater than 5 mm electrode gap between the highvoltage electrode and ground electrode in the reactor housing. In orderto operate the system safely it is preferred to power the system througha switch box 45 that features a ground fault circuit interrupt. Thisemergency stop system will trigger if the current flowing from thedevice does not match the current sinking into the device.

The following are examples wherein a treatment system 10 according tovarious embodiments of the invention was tested.

Example 1A. Direct Discharge into an Unprotected System

In the first set of experiments, a pilot cooling tower was used.Components of this experimental system that correspond with the systemsdepicted in FIG. 1 are labeled according to the reference numbers inFIG. 1. A cooling tower (total volume 100 L) water system 12 was chargedwith water and the system was set to circulate. The water chemistry wasmonitored using an Advantage Control system and biological monitoring asperformed using two in-house biological monitoring systems and aChemTrak biological monitor. These systems are typically found or aresimilar to those typically found in larger scale commercial orindustrial cooling tower operations. To incorporate the high voltagegenerator system into the cooling tower, a side-stream flow (stream 18)was pulled from the heat exchanger rack via a mechanical ball valve and12 feet of 0.75 inch diameter clear flexible PVC tubing. This valveallows the system to change flow dynamics based on the specificcomposition of the water being treated. For example, changing the flowrate past the venturi changes how the gas bubbles are distributed intothe water and this in turn can change the form of the plasma generatedat the high voltage discharge electrode. Also volume and flow rate areimportant in terms of treatment of the entire system water forbiological control using directed high voltage discharge becausesuccessful treatment depends not only on the amount of energy beingdelivered, but also the treatment time. Since bacteria are constantlyreplicating in a typical system within a large volume of water, it isimportant to achieve a high enough flow rate through the reactionchamber 36 in order to ensure that the entire volume of system water isrepeatedly treated or cycled through the high voltage discharge zone toincrease total treatment time (the total amount of time a column ofwater with biological constituents in contact with the high voltagedischarge).

Using this setup on the pilot cooling towers allows for a maximum of 2gpm side-stream flow. This tubing was connected to a plasma chamber 36via a threaded polyethylene barbed fitting. At the outlet of thereaction chamber, 5 feet of clear PVC tubing is used to drain the waterexiting the reaction chamber (stream 50) into the sump 54. None of thegrounding points (such as ground 52 and 56) described with respect to apreferred embodiment above was put in place. The reaction chamber 36 wasconnected to a high voltage generator system 40. The unit was activatedand a pulsed spark discharge in water with 1,500 pmhos conductivity wasobserved over a 1 cm electrode gap. Immediately upon activating the highvoltage generator system 40, flow control relays of water system 12began to activate off and on, cutting off power to the water system 12.The electronics in the Advantage Controller over loaded and shut thesystem down and the biomonitor output (located on the other side of theroom from the high voltage generator system 40) overloaded and shut off.FIGS. 2A and 2B show the electromagnetic fields measured in the waterwith the plasma unit on in this test embodiment, with water flow and nowater flow with the electromagnetic fields traveling through the waterin both cases. It can be seen that when the water is flowing (FIG. 2A)there is a high resonance electromagnetic pulse penetrating the watercirculating through the system. It can be seen that even when the wateris not flowing (FIG. 2B) there was still a measurable electromagneticfield resulting from the high voltage discharge.

Example 1B. Direct Discharge into a Protected System

The experiment of 1A was repeated, but with a multiple ground protectivesystem in place. Grounds were placed in a sump 54 and parts of thetubing (using a screw and wire wrapping as discussed above) throughoutsystem. FIG. 3 shows that there is a significant reduction in theelectromagnetic field in the water. Using the multiple ground system, itis now possible to run the high voltage discharge system for severalhours continuously without causing problems to the electronic controland monitoring equipment used as part of the water system 12.

Example 2. Bench Trials for Removal of Microorganisms

Four bench-level studies were conducted to determine the efficacy of anon-thermal plasma discharge in water to inactivate microorganisms. Itis known that a plasma discharge in water will generate active oxygenspecies, UV radiation, and pressure field shock waves all of which caninactivate microorganisms. A plasma discharge can be achieved byincreasing the electric field in a solution beyond its breakdownvoltage. The breakdown voltage is dependent on the conductivity and thedielectric properties of the solution. It has been observed that arelationship exists between the input energy and the log reduction ofthe microorganisms in the system. It has also been documented that theinput energy needed to achieve a one log reduction (known as D-value) inE. coli can vary from 14 J/L to greater than 366 J/L. As for experimentswith certain species of pseudomonas, it has been reported that 85 kJ/Lis the average input energy needed to achieve one log reduction.

In a first experimental set, a rod to cylinder electrode configurationwas placed in a beaker containing 1,600 mL of water (800 mL of tap waterand 800 mL of distilled water). Ozone generated from a Marx generator(from the non-thermal plasma's voltage multiplier) was aerated into asecondary beaker containing 1,600 mL of water (also 800 mL of tap waterand 800 mL of distilled water) (beaker #2). For these tests, Escherichiacoil (E. coli) was utilized because of its high susceptibility toinactivation by directed energy methods. For each of the beakerscontaining 1,600 mL of the described water, 2 mL of a TSB stock solutionwith a known concentration of suspended E. coli was used to inoculateeach of the water filled beakers for a final E. coli concentration of4.65×10⁶ cfu/mL (Test #1) and 4.50×10 cfu/mL. For the plasma only beakertest (beaker #1), the cylinder electrode diameter was increased from a %inch (which generated an arc discharge) to a 1 inch size so that apulsed corona was generated during the discharge. A purpose of this testwas to determine which of an arc discharge (which puts more energy intothe system, which is preferred) or a pulsed corona results in the mostbiological inactivation.

As for the ozone treatment only beaker, ozone was pushed through a Marxgenerator chamber and bubbled into the beaker with the use of anairstone. During the experiments, 25 mL samples were collectedIndependently from each beaker at 0 min., 2 min., 4 min., 10 min., 20min., and 30 min. and bioassayed for cfu/mL determination. The resultsof the pulsed corona discharge plasma only test are shown in Table 1below under Test #1.

A second experiment combined the aerated ozone and a rod to cylinderelectrode setup into a single beaker containing 1,600 mL of water (800mL of tap water and 800 mL of distilled water) (Test #2). For this test,2 mL of a TSB stock solution with a known concentration of suspended E.coli was used to inoculate the water filled beaker for a final E. coliconcentration of 6.10×10⁶ cfu/mL. The cylinder electrode diameter ¼ inchso that a pulsed spark (pulsed arc discharge) would be generated in thesolution during discharge and the ozone generated by a Marx generatorwas bubbled into the beaker beneath the electrode setup. During theexperiment, 25 mL samples were collected at 0 min., 10 min., 30 min., 45min., and 60 min. and bioassayed for cfu/mL determination. The resultsare shown in Table 1 below under Test #2.

A third experiment featured a rod to cylinder electrode configurationplaced in a beaker containing 1,600 mL of water (800 mL of tap water and800 mL of distilled water) (Test #3). Ozone generated from a Marxgenerator (from the non-thermal plasma's voltage multiplier) was aeratedinto a secondary beaker containing 1,600 mL of water (again 800 mL oftap water and 800 mL of distilled water). For this study, Escherichiacoli (E. coli) was utilized because of its high susceptibility toinactivation by directed energy methods. For each of the beakerscontaining 1,600 mL of the described water, 2 mL of a TSB stock solutionwith a known concentration of suspended E. coli was used to inoculateeach of the water filled beakers for a final E. coli concentration of3.05×10⁶ cfu/mL and 3.40×10⁶ cfu/mL respectively. Similar to the secondexperiment, the cylinder electrode diameter was lowered so that a pulsedspark (pulsed arc discharge) would be generated in the solution duringdischarge. As for the ozone treatment only beaker, ozone was pushedthrough the Marx generator chamber and bubbled into the beaker with theuse of an airstone. During the experiment, 25 mL samples were collectedindependently from each beaker at 0 min., 10 min., 15 min., 30 min., and45 min. and bloassayed for cfu/mL determination. The results are shownin Table 1 under Test #3.

In a fourth experiment, the aerated ozone was combined with and a rod tocylinder electrode setup into a single beaker containing 2,000 mL ofwater (1,000 mL of tap water and 1,000 mL of distilled water) (Test #4).For this test, 5 mL of a TSB stock solution with a known concentrationof suspended Pseudomonas putida was used to inoculate the water filledbeaker for a final Pseudo. putida concentration of 7.00×10⁷ cfu/mL.Different from the first experiment, the cylinder electrode diameter waslowered so that a pulsed spark (pulsed arc discharge) would be generatedin the solution during discharge and the ozone generated by a Marxgenerator was bubbled into the beaker beneath the electrode setup.During the experiment, 25 mL samples were collected at 0 min., 15 min.,30 min., 45 min., and 60 min. and bloassayed for cfu/mL determination.The results are shown in Tables 1 and 2.

TABLE 1 Summary of Plasma Effectiveness Studies (Bench-Level Testing)Test 1 (E. coli) Test 2 (E. coli) Test 3 (E. coli) Test 4 (Pseudo.putida) Plasma Only Study Plasma + Ozone Study Plasma Only StudyPlasma + Ozone Study Pulsed Corona Pulsed Spark (Pulsed Arc) PulsedSpark (Pulsed Arc) Pulsed Spark (Pulsed Arc) Discharge in a beaker withDischarge plus Ozone Discharge in a beaker with Discharge plus Ozone noOzone Treatment no Ozone Treatment Sample Sample Sample Sample 0 min.(Control) Log 0 min. (Control) Log 0 min. (Control) Log 0 min. (Control)Log 6.67 log (cfu/mL) Reduction 6.79 log (cfu/mL) Reduction 6.48 log(cfu/mL) Reduction 7.00 log (cfu/mL) Reduction  2 min. 0.15 10 min. 1.2810 min. 2.74 15 min  0.72  4 min. 0.23 30 min. 5.79 15 min. 3.82 30 min.1.46 10 min. 0.40 45 min. 5.14 30 min. 4.20 45 min. 1.55 30 min. 0.99 60min. ≥6.79 45 min. 4.46 60 min. 1.85

TABLE 2 Summary of Plasma Effectiveness Studies (Bench-Level Testing)Sample CFU/ml Log₁₀ Density (Plasma ONLY) Study Using E. coli as TargetOrganism Control 3.05.E+06 6.48 10 min Post Treatment 5.45.E+03 3.74 15min Post Treatment 4.60.E+02 2.66 30 min Post Treatment 1.90.E+02 2.2845 min Post Treatment 1.05.E+02 2.02 Plasma + Ozone Study Using E. colias Target Organism Control 6.10.E+06 6.79 10 min Post Treatment3.25.E+05 5.51 30 min Post Treatment 1.00.E+01 1.00 45 min PostTreatment 4.50.E+01 1.65 60 min Post Treatment Below LOD Below LOD(Ozone ONLY) Study Using E. coli as Target Organism Control 3.40.E+066.53 10 min Post Treatment 6.60.E+05 5.82 15 min Post Treatment6.35.E+05 5.80 30 min Post Treatment 1.23.E+05 5.09 45 min PostTreatment 1.17.E+05 5.07 Plasma + Ozone Study Using Pseudo. putida asTarget Organism Control 1.01.E+07 7.00 15 min Post Treatment 1.92.E+066.28 30 min Post Treatment 3.45.E+05 5.54 45 min Post Treatment2.85.E+05 5.45 60 min Post Treatment 1.43.E+05 5.15

Referring to FIG. 4, a field test was also performed using a preferredembodiment of the system and method of the invention. The goal for thisfield test was to install a plasma water treatment system 110 in acooling tower water system 112 that used oxidizing biocides to controlthe microbial population in the water. The cooling tower water system112 had a total volume of 1,400 gallons and was situated at street leveloutside the administrative building of a local University. A controlunit 115 that monitored water flow and water conductivity was used tocontrol the water system blow down and chemical feed into the sump 154.This unit maintained water conductivity between 900 pmhos and 1500pmhos. The plasma treatment system 110 comprises a high voltagegenerator 140 and a plasma reaction chamber 136. High voltage generatorcomprises a Marx ladder or Marx generator 142 disposed within a sparkgap chamber 141 within an outer housing 143 that includes a dielectricbarrier. Ozone gas stream 130 is withdrawn from spark gap chamber 141and is injected into inlet water stream 114 via a venturi 121. Althoughnot used initially in this test, air 122 and/or reactive gas 126 couldalso be injected into the water stream through a micro-bubbler orsimilar device 120. A tee, mixer, or similar connecting device 129 maybe used to infuse stream 124 (containing ozone) with micro-bubbles ofair and/or reactive gas from micro-bubbler 120 and provide an inlet intoreaction chamber 136. Reaction chamber 136 comprises a sealed,water-tight housing 135 surrounded and shielded by an inner dielectricbarrier layer 134 a and outer ground shield 134 b. The dielectricbarrier 134 a is a non-conductive layer that prevents arcing to theground layer 134 b, which is a conductive outer layer tied to theground. Within reaction chamber 136 are disposed a high voltageelectrode and a ground electrode which generate a plasma dischargewithin chamber 136 as voltage generated in high voltage generator 140 istransmitted to the high voltage electrode within chamber 136 via wire138. Wire 138 may act as the high voltage electrode or may be connectedto a thicker rid or other conductor to act as the electrode. Anotherground 148 is also disposed in contact with ground layer 134 bsurrounding housing 135. Ground 148 may act as the ground electrode ormay be connected to a thicker rod or other conductor to act as theelectrode. Reaction chamber 136 in this field test was around 4 inchesin diameter. The reaction chamber 136 in this field test was plumbeddirectly into the existing water lines of water system 112. The reactorinlet 129 was connected to the water line 114 from the high pressureside of the pump 113 which was removing the water from the cooling towersump 154. A venturi 121 inserted into the line between the pump 113 andthe reactor 136 was used to draw ozone gas 130 generated by the Marxladder 142 into the water being treated. The treated water 150 exitingthe reaction chamber 136 was returned to the output side of the chillerwhere it circulated back into the cooling tower.

When the system 110 was installed initially, none of the recommendedprecautions or protective measures mentioned in reference to FIG. 1 andtreatment system 10 were in place. The system 110 was installed in closeproximity to the water system master control system, it was notgrounded, there was no shielding of the controller unit and there wereno ferrite beads around the sensors leads for EMI suppression. The highvoltage generator 140 was plugged directly into main electrical outletin the wall.

To start the process, water stream 114 was introduced into the reactionchamber 136 and the high voltage system 140 was activated. Immediatelythe electromagnetic feedback through the water caused the conductivitymeter on the water system 112 to jump to 6000 μmhos, forcing the watersystem 112 into an immediate blow down mode that resulted in water beingdumped to the drain. Without one or more of the protective measuresreferenced with system 10 of FIG. 1, it would be impossible toeffectively operate a high voltage discharge treatment system in acooling water system.

The set-up of systems 110 and 112 were then reconfigured with the watercontrol unit 170 (used to control various components of the water system112) being isolated within a housing 172 and by clamping ferrite beads158 around the wires leading to the conductivity sensor 116. Housing 172encloses water system control unit 170 during operation of system 110,but comprises an openable door or a removable cover so that the interiormay be accessed for service. Housing 172 is preferably a metal box, butother shielding materials such as plastics, concrete or metal plasticcomposites may also be used. The high voltage generator 140 was moved tothe opposite side of the room from the controller (approximately 12 feetaway, and preferably at least 6 feet away) and the power supply 146 wasswitched from directly connected to the mains to being run through aUPS. The sump 154 in the cooling tower was grounded 156, as was thereturn (treated) water line 150 grounded by 151. Optionally, ferritebeads 153 may also be wrapped around treated water line 150. When thesystem 110 was activated there was no negative impact on the controlsystem 170 or sensor 116, allowing the cooling tower system 112 tooperate normally.

Using this set up, the water treatment system 110 was run for 6 monthswithout the addition of biocide. During the process, ozone gas 130generated in the Marx ladder 142 was introduced into the water enteringthe reaction chamber 136. This produced a fine stream of bubbles at thehigh voltage electrode surface. When the water had a low conductivityaround 900 pmhos this would be sufficient to generate a plasmadischarge, but as the conductivity increased with increasing number ofcycles of concentration, this was no longer adequate to generate aplasma discharge in the reaction chamber. As the water conductivityincreases, parasitic electrochemical reactions become the favoredmechanism for the discharge of the electrons, and the ability togenerate a plasma is diminished. Additional air 122 was introduced intothe reaction chamber that provided a more robust air curtain between theground electrode and the high voltage discharge electrode allowingplasma to be generated in water with conductivity in excess of 1500pmhos. Once the conductivity reaches a pre-set threshold, usually around1500 pmhos, the cooling tower or other water system goes into blow downmode, dumping the high conductivity water to the drain and replacing itwith new water (usually fresh water from a municipal supply, but otherwater sources with lower conductivity levels may be used).

Referring to FIG. 5, another preferred embodiment of plasma treatmentsystem 210 was tested in a second field trial. System 210 was Installedto treat a 2,200 gallon stainless steel/galvanized cooing tower watersystem 212. During this installation, the high voltage generator 240 andthe plasma reactor chamber 236 were shielded within a housing 260 andplaced on the outside wall away from the water control unit 270 andsensors 216 of water system 212. Housing 260 is preferably at least 6feet away from water control unit 270 and sensors 216. Housing 260 ispreferably made of metal, but other materials such as plastic or metalplastic composites may also be used. Housing 260 encloses system 210during operation, but comprises an openable door or a removable cover sothat the interior may be accessed for service. When housing 260 is used,it is not necessary to enclose control unit 170 in a housing (such ashousing 172 used with system 110), but such a housing may also be usedfor added protection of the control unit. The water 214 from the sump254 was circulated through the plasma reactor using a pump 213 that wasplaced directly in to the sump 254 which was grounded 256. The highvoltage generator 240 was connected directly to the main electricaloutlet as power supply 246, but the outlet was on its own breakercircuit. With this set-up, system 210 was able to continuously operatefor 6 months (at which time the cooling system was shut-down for winter,but it is believed the system could have continued operating with thisembodiment of the invention for a longer period if cooling was needed)without any electrical or EMI issues interfering with operation of watersystem 212.

Any combination of protective measures, such as a grounded piece ofmetal or mesh with a large surface area placed within a sump (similar to56), electromagnetic interference suppressors (such as 58), groundedwire wrapped pipe segments or ferrite beads (such as 52 or 158 or 258),a protective housing (such as 260) around the high voltage generator andplasma reaction chamber, a protective housing around the water controlunit (such as 172), locating the high voltage supply and reactionchamber a sufficient distance from the water control unit and sensors,segregated power supply for the high voltage generator (such as anoutlet on its own breaker circuit or a UPS or isolation transformer),and/or segregated power supply for the water control unit or sensors(such as a separate UPS or isolation transformer) may be used with anytreatment system according to the invention to protect the water systemcomponents from any interference or damage and to permit the treatmentsystem to operate continuously for extended periods of time. Anycombination of grounding devices may also be used with any treatmentsystem according to the invention to harvest (and to store usingcapacitors or inductors) excess energy generated by the treatment systemand to generate low level energetic fields (electromagnetic orelectrochemical) that provide further benefits to the water treatmentprocess.

The ability to control pressure drop across a reactor housing withinwhich a plasma discharge will occur, is important for ensuringsufficient discharge, especially if ozone, air or other gas is beingadded to the inlet water stream to supplement the dielectric barrier ofthe high voltage discharge electrode. Paschen's Law is an equation thatdescribes the break down voltage necessary to start a discharge betweentwo electrodes as a function of pressure and gap length (distancebetween the high voltage electrode and ground electrode). In theinitiation of a plasma discharge, the first ionization energy of anelectron must be reached to dislodge and liberate an electron that whenaccelerated results in chain reaction electron avalanche as theliberated electrons collide with the atoms. The higher the pressure ofthe discharge medium the more collisions that occur as the electrontravels from the discharge electrode to the ground, and this randomizesthe electron direction, which in turn can result in electrondeceleration resulting in a failed discharge between the electrodes.Because water can be viewed as a highly condensed gas, pressure dropacross the electrode becomes a major contributing factor to the abilityto successfully produce an electrohydraulic discharge within reactorhousing.

Additionally, as flow velocity through the reactor housing increases,choke points can develop in certain areas of flow through the reactorhousing and these choke points cause pressure increases that impact thepressure drop across reactor housing. In order to successfully dischargeplasma in reactor housing, it is preferred to minimize these potentialchoke points. As such, it is preferred that the treatment systemsaccording to the invention (such as system 10, 110, or 210) beconfigured so that treated water stream on the outlet end of reactorhousing has the highest flow coefficient possible, according to thefollowing equation:

$C_{v} = {F\sqrt{\frac{S\; G}{\Delta\; P}}}$where C_(v)=Flow coefficient or flow capacity rating of valve. (volumeof water of flow in gpm)F=Rate of flow (US gallons per minute)SG=Specific gravity of fluid (Water=1)ΔP=Pressure drop across body (psi).

There are several factors that can be manipulated either individually ortogether, that will optimize the pressure drop across the body and theflow rate of the fluid through the reactor. Lowering the flow rate isnot desirable, as that lowers the flow coefficient and it is preferredthat the flow coefficient on the discharge end be as high as possible.Lowering the flow rate also minimizes contact time and decreasesefficiency, which are not desirable. Additionally, it is preferred tominimize the pressure drop across reactor housing 135 to increase theflow coefficient. In experiments conducted using treatment systemsaccording to the invention, it was determined that minimizing thepressure on the discharge end of reaction chamber aids in the formationof plasma by lowering the breakdown voltage. In high conductivity water,such as the water frequently encountered in re-circulating water system,lowering the breakdown voltage results in less parasitic current losses(V=iR) and therefore more energy will be input into the water beingtreated via plasma.

In addition to minimizing the pressure on the discharge end, diminishedplasma generation associated with increased conductivity in the waterbeing treated may also be addressed by (1) moving the high voltageelectrode and the ground electrode closer together (but this has thedrawback of reducing the volume of water being exposed to the plasmadischarge), (2) increasing the voltage between the ground and highvoltage electrode (but this has the drawback of possible componentfailure in the high voltage generator), or (3) increasing the gas phasedielectric barrier around the high voltage electrode. The treatmentsystems and methods according to the invention most preferably rely onincreasing the gas phase dielectric barrier through the use of a gasinfusion system to add bubbles to the water being treated as the mostfavorable way to aid in plasma generation in high conductivity water.

Referring to FIGS. 6-7, a preferred embodiment of a reaction chamber 136and electrode mount assembly 80 are shown. The reaction chamber 136 islike that shown in FIG. 4 and could be used with treatment system 10,110, or 210. Reaction chamber 136 comprises a sealed, water-tighthousing 135 capped at both ends 137, 139 and having fittings 129, 133that allow water and gasses to be introduced and removed from thereactor housing 135, and for electrical connections to be made with thehigh voltage electrode 138 and ground electrode 148. In this embodiment,a continuous stream of water 114 is pumped from a source in the watersystem being treated into the reactor housing 135 and then out throughthe top as treated water 150. As the water flows into the reactorhousing 135, ozone gas 130 (preferably generated in the high voltagepower supply 140 (not shown in FIG. 6)), may be introduced into thewater using a venturi 121 or other type of gas injector/diffuser. Thewater/ozone mixture 124 then enters inlet port 129 where is itoptionally mixed with compressed air 122 or other gases (which may bebubbled through a microbubbler, such as 120) prior to entering reactorhousing 135. Disposed within reactor housing 135 is an electrode mountassembly 80 connected at one end to high voltage electrode 138 and atthe opposite end to ground electrode 148. The potential differencebetween the high voltage electrode and the ground electrode results in aplasma discharge in the water between the high voltage base 82 andground base 92, in an area referred to herein as the high voltagedischarge area or zone or plasma discharge area or zone (shown as 101 onFIG. 6).

Referring to FIGS. 6-14, disposed within reactor housing 135 is anelectrode mount assembly 80. Electrode mount assembly 80 preferablycomprises a high voltage base 82, a ground base 92, and a groundelectrode tube 147. The high voltage base 82 and ground base 92 areconfigured to hold the high voltage electrode and ground electrode at afixed distance from each other, so that the electrode gap is around 1 to10 mm, and most preferably around 5 mm. This distance allows asufficient volume of water to be exposed to the plasma, particularlywhen the preferred ground electrode configuration as discussed below isused, while not requiring an increase in the output voltage from thehigh voltage generator. High voltage base 82 preferably has awheel-shaped configuration comprising a central hub 88, a plurality ofspokes 86 extending radially outward from hub 88 and terminating atouter ring or rim 84. Hub 88 preferably has a slightly tapered ortruncated cone configuration (as shown in FIG. 8), but may also besubstantially cylindrical. An opening 90 is disposed though hub 88 andhigh voltage wire 138 (or a thicker rod or conducting material connectedto wire 138) fits within opening 90 to act as a high voltage electrode.Most preferably, high voltage wire 138 has a dielectric coating on itsentire length to minimize parasitic electrochemical reactions.

Spokes 86 are preferably angled relative to hub 88 and rim 84 (as shownin FIGS. 6-7), which minimizes the contact area of the hub to the highvoltage wire electrode, thereby increasing charge density on theelectrode by reducing conduction through the plastic material of thehub. Rim 84 is preferably has a shape and size configured to mate withthe shape and size of reactor housing 135 (or 35 or 235). Reactorhousing is most preferably cylindrical, so rim 84 is also preferablycylindrical with a diameter slightly smaller than the inner diameter ofreactor housing 135 so that high voltage base 82 may be inserted intothe reactor housing 135 and will fit snugly against an internal wall ofhousing 135. The open wheel-like configuration of high voltage base 82aids in eliminating any pressure choke points that could impede theplasma production.

Another preferred embodiment of a high voltage base 182 for use withelectrode mounting assembly 80 is shown in FIGS. 9A-9B. High voltagebase 182 preferably comprises a central hub 188, a plurality of spokes186 extending radially outward from hub 188 and terminating at rim 184.High voltage base 182 is similar to base 82, except in this embodimenthub 188 is preferably substantially cylindrical and spokes 188 are notangled relative to hub 188 and rim 184. A substantially cylindrical hubprovides greater precision in the gap distance between the high voltagewire/electrode and the ground electrode. A substantially cylindrical hub188 may also be used with angled spokes, similar to FIGS. 6-7.

Referring to FIGS. 7 and 10-13, ground base 92 preferably comprises arim 94, a body 96 extending from rim 94, and a collar 98 extending frombody 96. An opening 100 is disposed through collar 98. Rim 94 preferablyhas a shape and size configured to mate with the shape and size ofreactor housing 135 (or 35 or 235). Reactor housing is most preferablycylindrical, so rim 94 is also preferably cylindrical with a diameterslightly smaller than the inner diameter of reactor housing 135 so thatground base 92 may be inserted into the reactor housing 135 and will fitsnugly against an internal wall of housing 135. Body 96 preferably has aclosed, truncated cone or dome like shape, which aids in funneling anyadded gas bubbles into plasma discharge zone 101 and toward high voltageelectrode 138.

Another preferred embodiment of a ground base 192 is shown in FIG. 14.Ground base 192 preferably comprises a rim 194, a body 196 extendingfrom rim 194, and a collar 198 extending from body 196, all similar toground base 92. An opening 200 is disposed through collar 198. Unlikeground base 92, ground base 192 has an added wheel-like structure(similar to high voltage base 182). Ground base 192 also comprises acentral hub 204, a plurality of spokes 202 extending radially outwardfrom hub 204 and terminating at rim 194, and an opening 206 disposedthrough hub 204.

A ground wire 148 is disposed through opening 100 and connected toground electrode tube 147. A tab with an aperture may be provided at anend of ground electrode tube 147 to facilitate connection to ground wire148. Most preferably, ground electrode tube 147 (as shown in FIGS. 6-7)comprises a substantially cylindrical body (or other shape configured tobe inserted in collar 98) or hollow tube with a plurality of openings149 disposed through a sidewall of the body. Ground electrode tube 147is preferably made of titanium, but other conductive materials, such asstainless steel or copper may also be used. Openings 149 are preferablycircular having a diameter between about 4 mm and 8 mm; but other shapesmay also be used. The size of the openings 149 are large enough to allowexcess gas to escape and prevent a pressure choke point inside plasmadischarge zone 101. Openings 149 have the advantage of greater fieldenhancement around the edges of the openings, which produce unformedfield lines that enhance the effect of the field. Openings 149 also havethe advantage of allowing the plasma discharges to be visible (as abright light) when reactor housing 135 is clear or has a viewing window.An exterior sidewall of ground electrode tube 147 preferably has adielectric barrier coating, such as non-conductive ceramic or glass, toreduce parasitic electrochemical reactions on the outer surface ofground electrode tube 147 and maximize the potential for generating aplasma in the plasma discharge zone 101.

Ground electrode tube 147 is most preferably configured to fit withincollar 98 and within hub 88 (as shown in FIG. 7) to connect high voltagebase 82 and ground base 92. Ground electrode tube 147 may be releasablyattached to collar 98 and/or hub 88, such as by screws. Alternatively,ground electrode tube 147 may not extend all the way to hub 88 (as shownin FIG. 6). In that configuration, high voltage base 80 and ground base92 are spaced apart by their relative locations within reactor body 135and held in place by friction, another structure extending from groundelectrode base to high voltage base, or other means, such as a lip orother protrusion within reactor body 135 configured to mate with rims 94and 84, to position high voltage electrode 138 relative to groundelectrode tube 147. A lower end of high voltage electrode 138 isdisposed through hub 88 and into ground electrode tube 147. Althoughhigh voltage electrode 138 may extend all the way to ground electrodebase 92 or substantially through the length of ground electrode tube 147(as shown in FIG. 6), most preferably high voltage electrode 138 extendsinto tube 147 only a short distance of around 4 to 30 mm (as shown inFIG. 7) to avoid having the high voltage electrode interfere with theflow of water through reactor body 135. High voltage electrode 138 andground electrode tube 147 are preferably sized and configured to providea gap between the two electrodes of around 1 to 10 mm, and mostpreferably around 5 mm. In the configurations shown in FIGS. 6-7, wherehigh voltage electrode 138 is a rod partially disposed within andsubstantially concentric within ground electrode tube 147, the gap isthe radial distance between an outer wall of the high voltage electrodeand an inner wall of ground electrode tube 147. Ground electrode tube147 is most preferably around 2 to 4 inches in length. Having arelatively shorter electrode allows for greater charge concentration,which helps with the discharge.

High voltage wire 138 and ground wire 148 are preferably made of solidmetal, rather than braided wire. This makes connections easier because asolid wire is easier to seal in end fittings 137, 139 or ports 129, 133.Solid wiring also eliminates potential problems with water wicking fromthe reactor housing 135 to an inner wire core, which could be dangerous.

Electrode mounting assembly 80, and any variation on the components ofassembly 80, may be used with any reaction chamber/housing in anytreatment system and method according to the invention, includingreactor housing 35, 135, and 235. The preferred electrode mount andground electrode configuration as shown in FIGS. 6-7 allow plasma to begenerated under a range of water chemistry conditions. For example, asthe conductivity of the water increases with cycles of re-circulation,the amount of air/gas/ozone that can be delivered to the plasmadischarge zone 101 can be increased by simply changing the gas flowrate. Increased gas flow rate corresponds to an increase in the gasphase dielectric barrier to achieve greater plasma discharge under highconductivity conditions, without having to alter the distance betweenthe electrodes or increase the voltage between the ground and highvoltage electrode.

A series of tests were performed with a gas infusion system, reactionchamber, and electrode mount assembly similar to that shown in FIG. 6.The water system used was a cooling tower located at a local universityand the water had a conductivity range of 980 mmhos to 1900 mmhos. Thetreatment system was run continuously over a 4 month period. Thedischarge voltage was set at 240 kV and the electrode gap between thehigh voltage and ground electrodes was 5 mm. The reactor housing wasmade of transparent material so the inside of the housing was visible.During operation, plasma discharge between the ground and high voltageelectrode and bubbles being forced into the space between the ground andhigh voltage electrode were both observed. Once the conductivityincreased to over 1000 mmhos, plasma discharge was not observed with theuse of bubbles introduced through the venturi alone; however, plasmadischarge was again observed once additional compressed air wasintroduced into the space between the ground and high voltageelectrodes.

A preferred embodiment for a support structure 82 for a Marx generatorused in any high voltage generator according to the invention, such ashigh voltage generator system 40, 140, or 240, is shown in FIGS. 15-18.Support structure 62 preferably comprises upper support arm 66T, lowersupport arm 66B, and one or more end support arms 66E extending betweenlower support arm 66B and upper support arm 66T. Upper support arm 66Tpreferably forms a substantially rectangular shape with an open centralportion. Similarly, lower support arm 668B preferably forms asubstantially rectangular shape with an open central portion. Verticalend support arms 66E connect the upper and lower support arms 66T and66B at one end of the support structure 62 to form a generally U-shapedframe. The other end of the support structure 62 is preferablysubstantially open, with no vertical connectors to join arms 66T and66B. Attachment tabs 64 are preferably disposed at one end of supportstructure 62, extending outwardly from each of the top and bottomsupport arms 66T and 66B. Disposed through tabs 64 are apertures 65.Tabs 64 and apertures 65 facilitate securing the support structure 62 toa bottom surface of spark gap chamber 41 or outer housing 43, dependingon the configuration of chamber 41 and housing 43, or to a capacitorbank housing 77 disposed within spark gap chamber 41 or outer housing43. Support structure 62 may also be integrally formed from a singlepart with spark gap chamber 41 or outer housing 43.

Extending upwardly from each lower support arm 66B are a plurality ofpaired posts 70A-71A, 70B-71B, and 70C-71C. A plurality of first posts70A, 70B, and 70C extend from a first side (forward side) of lowersupport arm 66B and a plurality of second posts 71A, 718, and 71C extendfrom a second (rearward) side of lower support arm 66B. With referenceto FIGS. 20-21 (which show the Marx ladder support structure 62 oncapacitor bank housing 77, with connections between the two), and thecircuit diagram of FIG. 22. (which is representative of a typicalcircuit for a Marx generator or Marx ladder, that may be connected tosupport structure 62), a spark gap switch (S1, S2, etc.), comprising twospaced apart electrodes 76, is disposed between each pair of posts, suchthat S1 is between 70A and 71A and S2 is between 70B and 71B, etc.Disposed through each post is an aperture 72, though which a spark gapelectrode mount 73 is disposed. A spark gap electrode 76 is attached atan end of the spark gap electrode mount 73 disposed inside supportstructure 62. This forms a plurality of spark gap electrode pairsbetween each pair of posts 70A-71A, 70B-71B, etc. The electrodes 76 andmounts 73 are preferably configured to allow the electrode to movelaterally along the mount to selectively adjust the gap distance betweeneach pair of spark gap electrodes. Most preferably, the spark gapelectrode mounts 73 comprise a screw on to which each electrode 76 isattached in threaded engagement on an end of the mount 73 disposedwithin Marx ladder support structure 62. This preferred configurationallows the relative positions of each pair of electrodes 76 to beselectively modified to move them closer together or farther apartwithin Marx ladder structure 62 to increase or decrease the spark gapdistance by simply rotating the electrodes 76 along the length of mount73. Most preferably the spark gap distance between each pair ofelectrodes 76 is around 15 to 40 mm. Alternatively, each spark gapelectrode 76 may be fixed at an end of each mount 73 within structure 62and the mounts 73 may be configured for lateral movement relative toposts 70, 71 to selectively adjust the gap distance. A combination ofadjustable electrodes and adjustable mounts may also be used.

Most preferably, Marx ladder structure 62 rests on a capacitor bankhousing 77. Within capacitor bank housing 77 are a plurality ofcapacitors and resistors connected together according well-known Marxladder circuitry. A plurality of apertures are disposed through an upperend or removable cover of housing 77 to allow wiring 75 is pass in orderto connect the capacitors to the spark gap switches. An end of eachmount 73 disposed outside the Marx ladder structure 62 is connected bywiring 75 to capacitors within a capacitor bank housing 77, such thatcapacitor C1 is connected to the mounts 73 on post pair 70A-71A,capacitor C2 is connected to the mounts 73 on post pair 70B-71B, and soforth. Most preferably, 3 to 6 pairs of posts are provided for structure62, but additional pairs may be provided as needed to generatesufficient voltage as will be understood by those of ordinary skill inthe art. For example, there would be five pairs of posts for a circuitas shown in FIG. 22, one pair for each spark gap switch S1-S5.Variations in these arrangements may be made, as will be understood bythose of ordinary skill in the art.

The dimensions of structure 62 are preferably around 2 inches wide by 2inches high and 3 inches wide by 3 inches high, for a 14 inch length. Asdescribed herein, width is a dimension substantially between a pair ofposts 70-71, height is the dimension of vertical support arms 66E in adirection from lower support arm 66B toward upper support arm 66T, andlength is the longer dimension of support arms 66T, 66B in a directionfrom vertical support arms 66E toward tabs 64. These dimensions arepreferred in order to physically separate the spark gap electrodes toaid in preventing the spark gaps from being bridged by metal deposits,which would disrupt generation of the high voltage pulse in the Marxladder. Most preferably, the gap distance between the spark gapelectrodes 76 (the distance between a pair of electrodes 73 on each pairof posts 70-71, as shown on FIG. 20 as G) is around 15 mm to 40 mm, andmost preferably around 27 mm. The gap distance may be selectivelyincreased or decreased by moving electrodes 76 on electrode mounts 73,which changes the voltage produced by the high voltage generator.Additionally, other sizes for the support structure 62 may be used toscale the spark gap dimensions, particularly if a larger gap than whatis achievable by variation of distance on mounts 73 is desired.Additionally, larger widths and heights may be used, but it is believedthat much larger than 3×3 does not offer any significant advantage tooverall system operation because metal deposition in the channel is nolonger a factor in system failure at larger dimensions.

The support arms 66T, 66B, and 66E form a substantially open supportstructure frame. Many prior art Marx ladders are in enclosed structures,which can result in problems such as parasitic discharge as a result ofmetal depositing on the walls of the Marx chamber or support structure.By having a substantially open structure for a support frame 62, theseproblems are avoided. For example, by moving away from the closedsupport structure and moving to an open support system that physicallyisolates the spark gap electrodes from each other. With theconfiguration of the preferred support structure 62, including thepreferred dimensions, any metal deposits resulting from the spark gapdischarge cannot make a bridge between the electrodes and thereforecannot interfere with the discharge timing.

Support structure 62 is preferably made of ozone resistant materials,such as teflon, ABS, or fiberglass. Since ozone is generated by the Marxladder, it is preferred to use such resistant materials to fabricate thesupport structure 62 to avoid damaging the structure. Using materialsthat are susceptible to being attacked by ozone can weaken the supportstructure of the spark gap electrodes and with a repeated, substantiallycontinuous fire use needed for treating flowing water systems accordingto the invention, this weakened structure can undergo mechanical failureand break. It is also preferred to coat the surfaces of supportstructure 62 with oil, such as mineral oil or silicon oil. The oil willaid in preventing any metal from the spark gap electrodes fromdepositing onto to surfaces of support structure 62. If deposits areobserved they can be easily cleared away by wiping the oil layer off andreapplying a fresh coating. Additionally, it is preferred that lowersupport arm 66B, a lower portion of posts 70, 71, and a lower portion ofvertical end support arms 66E be submerged in an oil bath 74, as shownin FIG. 19.

Referring to FIGS. 19-21, a preferred housing configuration for highvoltage generator system 40 is shown. High voltage generator system 40preferably comprises an outer housing 43, a spark gap chamber 41, and aMarx ladder 42. Marx ladder 42 preferably comprises a support structure62, a capacitor bank housing 77, a low voltage driver circuit 39, aplurality of capacitors C, resistors R, and spark gap electrodes 76.Connections through outer housing 43 are provided for connecting anexternal power source (such as a wall outlet) to driver circuit 39 andfor connecting air pumps 44 to spark gap chamber 41 and for withdrawingozone (and other components of air) from within spark gap chamber 41.

Outer housing 43 is preferably a structure configured to enclose sparkgap chamber 41 and Marx ladder 42. It preferably has a removable coveror top or an openable door to allow access to the interior of thehousing 43 and access to spark gap chamber 41. Outer housing 43 ispreferably made from polycarbonate, lexan or another rigid polymer, butother materials may be used. Outer housing 43 also preferably includes adielectric barrier to isolate the Marx ladder 42 from the surroundingenvironment and prevent arcing from the internal components to nearbymetal structures, electrical outlets, and other monitoring and controlsystems. Such a dielectric barrier may be a separate layer of materialor coating on an inside or on an exterior of housing 43.

Capacitor bank housing 77 preferably has a removable upper cover oropenable door to allow access to the capacitors C and resistors R withinthe housing. Apertures are provided in the upper cover of housing 77 toallow wires to connect the capacitors to spark gap electrodes 76 throughspark gap electrode mounts 73. Another aperture is disposed throughhousing to connect the capacitor bank to low voltage driver circuit 39.Housing 77 is preferably configured to contain an oil bath 74 havingsufficient volume to at least partially submerge the capacitors. Mineraloil or silicon oil may be used for oil bath 74. Capacitor bank housing77 may be disposed within spark gap chamber 41 or may be external tospark gap chamber 41.

Spark gap chamber 41 may comprise another structure to enclose at leastthe Marx ladder support structure 62 and may enclose other components ofthe Marx ladder 42. Spark gap chamber 41 preferably has a removable topor cover or openable door so that support structure 62 (or othercomponents of Marx ladder 42 within spark gap chamber 41) may beaccessed. In that configuration, lower support arm 66B of Marx laddersupport structure 62 would rest on a bottom surface of spark gap chamber41. Alternatively, spark gap chamber may be a removable cover that fitsover support structure 62 (and may fit over other components of Marxladder 42) but does not have a bottom structure. In that configuration,lower support arm 66B of support structure 62 for high voltage generator42 would rest on an upper surface of capacitor bank housing 77 (oralternatively on a bottom surface of outer housing 43). If a removablecover is used, a seal is preferably provided to allow ozone to be pumpedor suctioned out of spark gap chamber 41. An interior surface of sparkgap chamber 41 and any piping or conduit used to transport the ozonegenerated by the high voltage generator 42 to reaction chamber 36 arepreferably made of ozone resistant materials, such as teflon, ABS, orfiberglass. The use of such resistant materials to fabricate these partsis preferred to avoid damaging them by exposure to ozone. A second oilbath 74 is optionally disposed in the bottom of spark gap chamber 41 orouter housing 43 or may be disposed in a separate tray or othercontainer (not shown) for Marx ladder support structure 62. Oil bath 74preferably has sufficient volume so that lower support arm 66B, a lowerportion of posts 70, 71, and a lower portion of vertical end supportarms 66E are submerged in the oil. Mineral oil or silicon oil may beused for oil bath 74. Support structure 62 is also preferably coated inoil. Outer housing 43 may be configured to act as a housing for highvoltage generator system 40 and a spark gap chamber, so that a separatespark gap chamber 41 is not required with modifications as will beunderstood by those of ordinary skill in the art. A configurationwithout a separate spark gap chamber may be particularly useful when aprimary outer housing is provided to contain both the high voltagegenerator system and reaction chamber (such as housing 260, whichcontains high voltage generator system 240 and reaction chamber 236).

Various apertures or ports are disposed through sidewalls on outerhousing 43, spark gap chamber 41, and capacitor bank housing 77 to allowpower to be supplied to the Marx ladder 42 from power system 46, toallow voltage to be carried from the Marx ladder 42 to reaction chamber36, to allow air to be blown into spark gap chamber 41 from airpumps/compressors 44 through a conduit 47, and to allow ozone 30 to beremoved. Air pumps 44 may be used to cool high voltage generator 42,pressurize the spark gap chamber 41, and/or to remove ozone (force ozoneout of spark gap chamber or outer housing) through a conduit or piping.A venturi or vacuum pump may also be used to remove ozone from spark gapchamber by suction and to pressurize spark gap chamber.

Most preferably, spark gap chamber 41 (or outer housing 43 if a separatespark gap chamber is not used) is maintained at a reduced pressure or anegative pressure, less than 1 atmosphere, which supports intermittentfiring of the spark gaps to periodically generate a high voltage pulse.Typical Marx ladder generators are operated at pressures greater than 1atmosphere. The treatment systems and methods according to the inventionrequire substantially continuous high voltage generation (repeatedcycles of charging and discharging, preferably with some period ofdeactivation for cooling between each repeated cycle) in order to treata flowing or re-circulating water system. In order to operate a Marxladder according to the invention, such as 42, 142, or 242, in such asubstantially continuous operation mode, it is preferred to reduce thepressure or operate in a vacuum, which allows the system to multiply atlower voltages and extends the life of the Marx ladder.

Any of the components of treatment systems according to the inventiondescribed herein, including various gas infusing system components,electrode mount assembly 80, and Marx ladder support structure 62, maybe used together in any combination with other components or otherembodiments within the scope of the invention. Any particular treatmentsystem embodiment, such as treatment systems 10, 110, and 210, is notlimited to only those components and configurations specificallydescribed with respect to that embodiment.

A preferred method of treating water in a flowing or re-circulatingwater system comprises generating a high voltage pulse in a high voltagegenerator preferably comprising a Marx ladder, directing the highvoltage pulse to a high voltage electrode disposed in proximity to aground electrode with a flow of water to be treated passing between theground and high voltage electrodes, and generating a plasma discharge inthe flowing water in a plasma discharge zone disposed between and aroundthe high voltage and ground electrodes. Most preferably, water flowscontinuously through the discharge zone and plasma is periodicallygenerated (around every 15 minutes) based on periodic operation of theMarx ladder. According to another preferred embodiment, a method oftreating water further comprises injecting air or other gas into theplasma discharge zone. According to yet another preferred embodiment, amethod comprises capturing ozone gas, which is produced as a by-productin generating the high voltage pulse in the Marx ladder, and injectingthe ozone into the plasma discharge zone. Most preferably, the injectionof air or gas increases as the level of conductivity in the waterincreases with repeated cycles of re-circulation. A preferred methodfurther comprises pumping air over or suctioning air through a housingfor the Marx ladder to aid in cooling the components of the Marx ladder,flushing ozone from within the housing, and pressurizing the housing andthe Marx ladder is preferably operated under reduced pressure or vacuumconditions. A preferred method further comprises protecting variouscomponents of the water system from interference or damage that may becaused by the high voltage pulse generation or plasma discharge.Additionally, excess energy produced by a high voltage discharge iscaptured and used to further condition the water in the water system.Most preferably, methods of treating water according to the inventionuse components of the water treatment systems described herein.

According to another preferred method, the conductivity of the water isperiodically measured (which measurements may be performed by existingequipment in the water system or equipment incorporated into a treatmentsystem) and one or more parameters of treatment are modified or adjustedwhen the conductivity level reaches a predetermined threshold. Theseoperating parameters may be adjusted by (1) moving the high voltageelectrode and the ground electrode closer together; (2) increasing avoltage of the high voltage pulse supplied to the high voltageelectrode; (3) increasing a rate of adding bubbles into the flowingwater stream; or (4) reducing the pressure of the flowing water streamat the outlet of the reaction chamber. Any combination of steps may beused to aid in plasma generation under high water conductivityconditions.

References herein to water systems include any type of flowing watersystem, including industrial, commercial, and residential, that requiresperiodic treatment to control or eliminate growth of microbiologicalspecies. Water flowing through the water system may contain contaminantsor chemical or biological treatment agents. References herein tocontinuous or substantially continuous and the like refer to operationsof a treatment system according to the Invention over a prolonged periodof time, with repeated cycles of activation/deactivation of treatmentsystem components, as occurring during normal operating periods of thewater system and treatment system and not during times of shut-down(such as seasonal shut-down of the water system or shut-down of thewater system or treatment system for maintenance). The componentsdepicted in the figures are not drawn to scale but are merely intendedas representations of the various components used in preferredembodiments of treatment systems according to the invention and watersystems with which those treatment systems are used. Additionally,certain components of the water systems depicted in the figures may bein other locations relative to other components of the water systems andthe systems of the invention than as depicted in the drawings. Those ofordinary skill in the art will appreciate upon reading thisspecification, that modifications and alterations to the system andmethods for treating flowing water with a plasma discharge and ozonewhile protecting the components of the water systems may be made withinthe scope of the invention and it is intended that the scope of theinvention disclosed herein be limited only by the broadestinterpretation of the appended claims to which the inventors are legallyentitled.

What is claimed is:
 1. A treatment system for treating water in aflowing water system with a plasma discharge and ozone, the treatmentsystem comprising: a high voltage generator comprising a plurality ofcapacitors, resistors, and spark gap electrodes configured in a Marxladder circuit, a support structure for the spark gap electrodes, and ahousing; a reaction chamber comprising an inlet configured to receive atleast a portion of water flowing through the water system as water to betreated, an outlet configured to return the portion of water back to thewater system after being treated with a plasma discharge and optionallyozone, and a reactor body; a gas infusion system disposed upstream ofthe inlet or within the reaction chamber to add bubbles of one or moregases into the water to be treated; a high voltage electrode and aground electrode at least partially disposed in the reaction chamber andconfigured to generate a plasma discharge within the water in thereactor body when a high voltage pulse is produced by the high voltagegenerator; an electrode mounting assembly disposed within the reactionchamber, the electrode mounting assembly configured to hold the highvoltage electrode and the around electrode within the reactor body; anoptional conduit configured to deliver ozone gas produced in the highvoltage generator from the housing to the gas infusion system; andwherein at least a part of the high voltage electrode is configured tocontact the water in the reactor body while the high voltage pulse istransmitted from the high voltage generator.
 2. The treatment system ofclaim 1 wherein the electrode mounting assembly comprises: a highvoltage mounting base comprising a first central hub configured toreceive the high voltage electrode, a first outer rim configured to matewith an interior wall of the reaction chamber, a plurality of spokesextending outwardly from the central hub toward the first outer rim anda ground mounting base comprising a second central hub configured toreceive the around electrode, a second outer rim configured to mate withthe interior wall of the reaction chamber, and a substantially closedbody disposed between the second hub and second outer rim.
 3. Thetreatment of claim 2 wherein the substantially closed body of the groundelectrode mounting base has a funnel or dome shape.
 4. The treatmentsystem of claim 2 wherein the high voltage mounting base and groundmounting base are configured to hold the high voltage electrode a fixedgap distance between around 1 and 10 mm from the ground electrode. 5.The treatment system of claim 4 wherein the ground electrode comprises asubstantially cylindrical and conductive tube having a plurality ofapertures disposed through a sidewall of the tube, wherein the tubeextends from the second hub toward the high voltage mounting base. 6.The treatment system of claim 5 wherein the high voltage electrodecomprises a rod that is at least partially disposed within andsubstantially concentric with the ground electrode tube and wherein thegap distance is a radial distance between an exterior surface of the rodand interior surface of the tube.
 7. The treatment system of claim 6,wherein around 4 to 30 mm of the rod is disposed within the groundelectrode tube.
 8. The treatment system of claim 5 wherein an exteriorsurface of the tube is coated with a dielectric barrier material.
 9. Thetreatment system of claim 1 wherein the support structure for the sparkgap electrodes comprises: an upper support arm having a substantiallyrectangular configuration with an open central portion, a lower supportarm having a substantially rectangular configuration with an opencentral portion, one or more vertical support arms connecting the uppersupport arm to the lower support arm in a spaced-apart relationship; aplurality of spaced-apart post pairs, each pair comprising a first postextending vertically from a first side of the lower support arm and asecond post extending vertically from a second side of the lower supportarm substantially opposite the first side.
 10. The treatment system ofclaim 9 wherein the upper support arm, lower support arm, and verticalsupport arms form an open, substantially U-shaped frame.
 11. Thetreatment system of claim 9 wherein the support structure has dimensionsof around 2 inches wide by 2 inches high to 3 inches wide by 3 incheshigh.
 12. The treatment system of claim 9 wherein the support structurefurther comprises a plurality of electrode mounts, each mount extendinginwardly from each of the first posts and each the second posts of thespaced-apart post pairs, wherein each electrode mount is attached to oneof the spark gap electrodes to form a plurality of electrode pairsbetween each spaced-apart post pair; and wherein a gap distance betweenthe spark gap electrodes in each electrode pair is around 15 mm to 40mm.
 13. The treatment system of claim 12 wherein the spark gapelectrodes are configured to move laterally along the electrode mountsto selectively adjust the gap distance.
 14. The treatment system ofclaim 13 wherein the electrode mounts comprises threads configured tomate with threads on the spark gap electrodes so that the spark gapelectrodes may be rotated to achieve lateral movement along theelectrode mounts.
 15. The treatment system of claim 12 wherein theelectrode mounts are configured to move laterally relative to the poststo selectively adjust the gap distance.
 16. The treatment system ofclaim 1 further comprising an oil bath disposed within the housing. 17.The treatment system of claim 16 wherein the support structure comprisesa lower support arm disposed below the spark gap electrodes and thelower support arm is submerged in the oil bath.
 18. The treatment systemof claim 16 wherein the capacitors are at least partially submerged inthe oil bath.
 19. The treatment system of claim 1 wherein the surfacesof the support structure are coated with oil.
 20. The treatment systemof claim 1 further comprising a venturi or vacuum pump to draw ozonegenerated in the high voltage generator into the conduit for delivery tothe gas infusing system.
 21. The treatment system of claim 1 furthercomprising an air pump to blow air through the high voltage generator.22. The treatment system of claim 1 wherein for treating water in aflowing water system is a recirculating water system and wherein aconductivity level of the water in the recirculating water systemincreases as it recirculates and the gas infusion system is configuredto begin supplying or increase an amount of gas supplied into thereactor body to generate the plasma discharge in the water as theconductivity level increases.